Method for forming photocatalytic apatite film
A method for forming a photocatalytic apatite includes a target production step (S) for producing a sputtering target that contains photocatalytic apatite, and a sputtering step (S) for forming a photocatalytic apatite film on a substrate by sputtering using the target. A firing step (S) for firing...
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| Main Authors | , |
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| Format | Patent |
| Language | English |
| Published |
08.01.2013
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| Online Access | Get full text |
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| Summary: | A method for forming a photocatalytic apatite includes a target production step (S) for producing a sputtering target that contains photocatalytic apatite, and a sputtering step (S) for forming a photocatalytic apatite film on a substrate by sputtering using the target. A firing step (S) for firing the photocatalytic apatite is conducted before the sputtering step so as to increase the crystallinity of the photocatalytic apatite. |
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