Method for fabricating nano devices

Embodiments relate to a method for fabricating nano-wires in nano-devices, and more particularly to nano-device fabrication using end-of-range (EOR) defects. In one embodiment, a substrate with a surface crystalline layer over the substrate is provided and EOR defects are created in the surface crys...

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Bibliographic Details
Main Authors Tan, Dexter, Pey, Kin Leong, Yeong, Sai Hooi, Chin, Yoke King, Ong, Kuang Kian, Ng, Chee Mang
Format Patent
LanguageEnglish
Published 25.12.2012
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Summary:Embodiments relate to a method for fabricating nano-wires in nano-devices, and more particularly to nano-device fabrication using end-of-range (EOR) defects. In one embodiment, a substrate with a surface crystalline layer over the substrate is provided and EOR defects are created in the surface crystalline layer. One or more fins with EOR defects embedded within is formed and oxidized to form one or more fully oxidized nano-wires with nano-crystals within the core of the nano-wire.