Lithographic apparatus and device manufacturing method

A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirro...

Full description

Saved in:
Bibliographic Details
Main Authors Vermeulen, Marcus Martinus Petrus Adrianus, Jeunink, Andre Bernardus, Loopstra, Erik Roelof, Ottens, Joost Jeroen, Compen, Rene Theodorus Petrus, Smits, Peter, Houben, Martijn, Van Abeelen, Hendrikus Johannes Marinus, Meulendijks, Antonius Arnoldus, Leenaars, Rene Wilhelmus Antonius Hubertus
Format Patent
LanguageEnglish
Published 18.09.2012
Online AccessGet full text

Cover

More Information
Summary:A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.