Surface roughening process

A process of forming a rough interface in a semiconductor substrate. The process includes the steps of depositing a material on a surface of the substrate, forming a zone of irregularities in the material, and forming a rough interface in the semiconductor substrate by a thermal oxidation of the mat...

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Bibliographic Details
Main Authors Aspar, Bernard, Blanchard, Chrystelle Lagahe, Sousbie, Nicolas
Format Patent
LanguageEnglish
Published 18.09.2012
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Summary:A process of forming a rough interface in a semiconductor substrate. The process includes the steps of depositing a material on a surface of the substrate, forming a zone of irregularities in the material, and forming a rough interface in the semiconductor substrate by a thermal oxidation of the material and a part of the substrate. Additionally, the surface of the oxidized material may be prepared and the surface may be assembled with a second substrate.