Lithographic apparatus and device manufacturing method

A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibr...

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Main Authors Beckers, Marcel, Donders, Sjoerd Nicolaas Lambertus, Hoogendam, Christiaan Alexander, Jacobs, Johannes Henricus Wilhelmus, Ten Kate, Nicolaas, Kemper, Nicolaas Rudolf, Migchelbrink, Ferdy, Evers, Elmar
Format Patent
LanguageEnglish
Published 04.09.2012
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Summary:A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.