Photosensitive polymer composition, method of producing pattern and electronic parts

1 2 A photosensitive polymer composition includes (a) a polyamide having a repeating unit represented by the following general formula (I): wherein U represents a tetravalent organic group, V represents a bivalent organic group and p is an integer representing a number of the repeating unit; (b) a c...

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Bibliographic Details
Main Authors Ooe, Masayuki, Komatsu, Hiroshi, Tsumaru, Yoshiko, Kawasaki, Dai, Katou, Kouji, Ueno, Takumi
Format Patent
LanguageEnglish
Published 31.07.2012
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Summary:1 2 A photosensitive polymer composition includes (a) a polyamide having a repeating unit represented by the following general formula (I): wherein U represents a tetravalent organic group, V represents a bivalent organic group and p is an integer representing a number of the repeating unit; (b) a compound which generates an acid upon receiving light; and (c) a compound represented by the following general formula (II): wherein m and n are each independently integer of 1 or 2, Rs are each independently hydrogen, alkyl group or acyl group, and Rand Reach independently represents fluoroalkyl group having 1 to 3 carbon atoms.