Purification of an H

21221The invention relates to a method for purifying or separating a supply gas flow containing at least one impurity, in which: a) said supply gas flow is contacted with a first adsorbent for the adsorption-removal of at least one said impurity; b) recovering said purified or separated gas; c) heat...

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Bibliographic Details
Main Authors Monereau, Christian, Rodrigues, Guillaume, Jallais, Simon
Format Patent
LanguageEnglish
Published 17.07.2012
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Summary:21221The invention relates to a method for purifying or separating a supply gas flow containing at least one impurity, in which: a) said supply gas flow is contacted with a first adsorbent for the adsorption-removal of at least one said impurity; b) recovering said purified or separated gas; c) heating a regeneration gas containing at least hydrogen (H) and carbon monoxide (CO) using a heater having a skin temperature (T) of between 150° C. and 200° C. during the gas heating phase; and d) periodically regenerating the adsorbent of step a) with the regeneration gas heated during step c) at a regeneration temperature (T) such that: T=T−ΔT with 5° C.<ΔT<50° C.