System, method and apparatus for self-cleaning dry etch

A method for cleaning a processing chamber that includes heating an inner surface of the processing chamber to a first temperature. The first temperature can be sufficient to cause a first species to become volatile. The first species can be one of several species deposited on the inner surface. A c...

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Bibliographic Details
Main Authors Bailey, III, Andrew D, Lohokare, Shrikant P, Howald, Arthur M, Kim, Yunsang
Format Patent
LanguageEnglish
Published 03.07.2012
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Summary:A method for cleaning a processing chamber that includes heating an inner surface of the processing chamber to a first temperature. The first temperature can be sufficient to cause a first species to become volatile. The first species can be one of several species deposited on the inner surface. A cleaning chemistry is injected into the processing chamber. The cleaning chemistry can be reactive with a second one of the species to convert the second species to the first species. The volatilized first species can also be output from the processing chamber. A system for cleaning the process chamber is also described.