Monitor for variation of critical dimensions (CDs) of reticles
The present invention provides a reticle for use in a lithographic process. The reticle, in one embodiment, includes a patterned layer located over a reticle substrate. The reticle may further include a test pattern located over the reticle substrate, wherein a portion of the test pattern is within...
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| Main Authors | , , |
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| Format | Patent |
| Language | English |
| Published |
12.06.2012
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| Online Access | Get full text |
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| Summary: | The present invention provides a reticle for use in a lithographic process. The reticle, in one embodiment, includes a patterned layer located over a reticle substrate. The reticle may further include a test pattern located over the reticle substrate, wherein a portion of the test pattern is within a step-distance of a portion of the patterned layer. In this embodiment, a variance in the test pattern is indicative of a variance in the patterned layer. |
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