Semiconductor device including conductive lines with fine line width and method of fabricating the same

A semiconductor device comprises a semiconductor substrate including a first core region and a second core region between which a cell array region is interposed, a first conductive line and a second conductive line extending to the first core region across the cell array region, and a third conduct...

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Bibliographic Details
Main Authors Seo, Hyeoung-Won, Roh, Byung-Hyug, Kim, Seong-Goo, Jeon, Sang-Min
Format Patent
LanguageEnglish
Published 24.04.2012
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Summary:A semiconductor device comprises a semiconductor substrate including a first core region and a second core region between which a cell array region is interposed, a first conductive line and a second conductive line extending to the first core region across the cell array region, and a third conductive line and a fourth conductive line extending to the second core region across the cell array region, wherein a line width of the first through fourth conductive lines is smaller than a resolution limit in a lithography process.