Protective film structure of metal member, metal component employing protective film structure, and equipment for producing semiconductor or flat-plate display employing protective film structure

A protective film structure of a metal member for use in an apparatus for manufacturing a semiconductor or the like, the protective film structure including a first coating layer of faultless aluminum oxide formed by direct anodic oxidation of a base-material metal of an aluminum alloy; and a second...

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Main Authors Ohmi, Tadahiro, Shirai, Yasuyuki, Morinaga, Hitoshi, Kawase, Yasuhiro, Kitano, Masafumi, Mizutani, Fumikazu, Ishikawa, Makoto, Kishi, Yukio
Format Patent
LanguageEnglish
Published 28.02.2012
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Summary:A protective film structure of a metal member for use in an apparatus for manufacturing a semiconductor or the like, the protective film structure including a first coating layer of faultless aluminum oxide formed by direct anodic oxidation of a base-material metal of an aluminum alloy; and a second coating layer formed on the first coating layer and made of yttrium oxide by a plasma spraying method.