Performance-aware logic operations for generating masks

A method for forming masks for manufacturing a circuit includes providing a design of the circuit, wherein the circuit comprises a device; performing a first logic operation to determine a first region for forming a first feature of the device; and performing a second logic operation to expand the f...

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Bibliographic Details
Main Authors Lu, Lee-Chung, Lin, Chung-Te, Wang, Yen-Sen, Chuang, Yao-Jen, Chang, Gwan Sin
Format Patent
LanguageEnglish
Published 21.02.2012
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Summary:A method for forming masks for manufacturing a circuit includes providing a design of the circuit, wherein the circuit comprises a device; performing a first logic operation to determine a first region for forming a first feature of the device; and performing a second logic operation to expand the first feature to a second region greater than the first region. The pattern of the second region may be used to form the masks.