Lithographic apparatus and device manufacturing method

A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination syst...

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Main Authors Van De Vijver, Yuri Johannes Gabriël, Van Schoot, Jan Bernard Plechelmus, Swinkels, Gerardus Hubertus Petrus Maria, Schimmel, Hendrikus Gijsbertus, Labetski, Dzmitry, Van Empel, Tjarko Adriaan Rudolf
Format Patent
LanguageEnglish
Published 14.02.2012
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Summary:A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.