Method to control uniformity using tri-zone showerhead

Embodiments of the present invention provide apparatus and method for processing a substrate with increased uniformity. One embodiment of the present invention provides an apparatus for processing a substrate. The apparatus comprises a chamber body defining a processing volume, a substrate support d...

Full description

Saved in:
Bibliographic Details
Main Authors Belen, Rodolfo P, Hammond, IV, Edward P, Hatcher, Brian K, Katz, Dan, Paterson, Alexander M, Todorow, Valentin N
Format Patent
LanguageEnglish
Published 29.11.2011
Online AccessGet full text

Cover

More Information
Summary:Embodiments of the present invention provide apparatus and method for processing a substrate with increased uniformity. One embodiment of the present invention provides an apparatus for processing a substrate. The apparatus comprises a chamber body defining a processing volume, a substrate support disposed in the processing volume, a showerhead disposed in the processing volume opposite to the substrate support, and a plasma generation assembly configured to ignite a plasma from the processing gases in the processing gas in the processing volume. The showerhead is configured to provide one or more processing gases to the processing volume. The showerhead has two or more distribution zones each independently controllable.