Variable resistance element, semiconductor device, and method for manufacturing variable resistance element

A method for manufacturing a variable resistance element includes the steps of: depositing a variable resistance material in a contact hole, which is formed on an interlayer insulating layer on a substrate and has a lower electrode at a bottom portion thereof, such that an upper surface of the varia...

Full description

Saved in:
Bibliographic Details
Main Authors Wei, Zhiqiang, Mikawa, Takumi, Takagi, Takeshi, Kawashima, Yoshio
Format Patent
LanguageEnglish
Published 06.09.2011
Online AccessGet full text

Cover

More Information
Summary:A method for manufacturing a variable resistance element includes the steps of: depositing a variable resistance material in a contact hole, which is formed on an interlayer insulating layer on a substrate and has a lower electrode at a bottom portion thereof, such that an upper surface of the variable resistance material in the contact hole is located lower than an upper surface of the interlayer insulating layer; depositing an upper electrode material on the deposited variable resistance material such that an upper surface of the upper electrode material in the contact hole is located higher than the upper surface of the interlayer insulating layer; and element-isolating by a CMP the variable resistance element including the variable resistance material and the upper electrode material.