Photoresist systems

New photoresist systems are provided that comprise an underlying processing (or barrier) layer composition and an overcoated photoresist layer. Systems of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.

Saved in:
Bibliographic Details
Main Authors Taylor, Gary N, Xu, Cheng-Bai
Format Patent
LanguageEnglish
Published 06.09.2011
Online AccessGet full text

Cover

Abstract New photoresist systems are provided that comprise an underlying processing (or barrier) layer composition and an overcoated photoresist layer. Systems of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.
AbstractList New photoresist systems are provided that comprise an underlying processing (or barrier) layer composition and an overcoated photoresist layer. Systems of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.
Author Xu, Cheng-Bai
Taylor, Gary N
Author_xml – sequence: 1
  givenname: Gary N
  surname: Taylor
  fullname: Taylor, Gary N
– sequence: 2
  givenname: Cheng-Bai
  surname: Xu
  fullname: Xu, Cheng-Bai
BookMark eNrjYmDJy89L5WQQDsjIL8kvSi3OLC5RKK4sLknNLeZhYE1LzClO5YXS3AwKbq4hzh66pcUFiSWpeSXF8elFiSDKwMLA0MjM3MCYCCUA_PMjcg
ContentType Patent
CorporateAuthor Rohm and Haas Electronic Materials LLC
CorporateAuthor_xml – name: Rohm and Haas Electronic Materials LLC
DBID EFH
DatabaseName USPTO Issued Patents
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EFH
  name: USPTO Issued Patents
  url: http://www.uspto.gov/patft/index.html
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
ExternalDocumentID 08012670
GroupedDBID EFH
ID FETCH-uspatents_grants_080126703
IEDL.DBID EFH
IngestDate Sun Mar 05 22:34:33 EST 2023
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-uspatents_grants_080126703
OpenAccessLink https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8012670
ParticipantIDs uspatents_grants_08012670
PatentNumber 8012670
PublicationCentury 2000
PublicationDate 20110906
PublicationDateYYYYMMDD 2011-09-06
PublicationDate_xml – month: 09
  year: 2011
  text: 20110906
  day: 06
PublicationDecade 2010
PublicationYear 2011
References Barclay et al. (6306554) 20011000
Zampini et al. (6503689) 20030100
Montgomery et al. (6605394) 20030800
Oberlander et al. (2003/0129531) 20030700
Shao et al. (6080530) 20000600
Hacker et al. (4760013) 19880700
Pavelchek et al. (6261743) 20010700
Zampini et al. (6576681) 20030600
Puligadda et al. (2003/0065164) 20030400
Shao et al. (2002/0045125) 20020400
Trefonas et al. (2002/0031729) 20020300
Chiong (4904564) 19900200
Pavelchek et al. (6190839) 20010200
Thackeray et al. (5851730) 19981200
Adams et al. (6602652) 20030800
Puligadda et al. (6323310) 20011100
Shih et al. (2003/0129542) 20030700
Pavelchek et al. (6316165) 20011100
Puligadda et al. (6524708) 20030200
Taylor et al. (2003/0228474) 20031200
Shao et al. (5935760) 19990800
Meador et al. (6156479) 20001200
Shao et al. (6042990) 20000300
(WO 02/086624) 20021000
Bruhnke et al. (6048662) 20000400
Taylor et al. (2002/0055061) 20020500
Nemoto et al. (5525457) 19960600
Flaim et al. (5693691) 19971200
Adams et al. (6410209) 20020600
Zampini et al. (6599951) 20030700
Sinta et al. (6033830) 20000300
Pavelchek et al. (2002/0022196) 20020200
Wayton et al. (2003/0180559) 20030900
Pavelchek et al. (6653049) 20031100
Thackeray et al. (6528235) 20030300
Mao et al. (2002/0028408) 20020300
Teng et al. (2003/0219603) 20031100
Takei et al. (6444320) 20020900
References_xml – year: 20011000
  ident: 6306554
  contributor:
    fullname: Barclay et al.
– year: 20030300
  ident: 6528235
  contributor:
    fullname: Thackeray et al.
– year: 20030600
  ident: 6576681
  contributor:
    fullname: Zampini et al.
– year: 20030800
  ident: 6605394
  contributor:
    fullname: Montgomery et al.
– year: 19981200
  ident: 5851730
  contributor:
    fullname: Thackeray et al.
– year: 20030700
  ident: 6599951
  contributor:
    fullname: Zampini et al.
– year: 20031100
  ident: 2003/0219603
  contributor:
    fullname: Teng et al.
– year: 20000300
  ident: 6042990
  contributor:
    fullname: Shao et al.
– year: 20030200
  ident: 6524708
  contributor:
    fullname: Puligadda et al.
– year: 19880700
  ident: 4760013
  contributor:
    fullname: Hacker et al.
– year: 20000600
  ident: 6080530
  contributor:
    fullname: Shao et al.
– year: 20010200
  ident: 6190839
  contributor:
    fullname: Pavelchek et al.
– year: 20010700
  ident: 6261743
  contributor:
    fullname: Pavelchek et al.
– year: 19971200
  ident: 5693691
  contributor:
    fullname: Flaim et al.
– year: 20020600
  ident: 6410209
  contributor:
    fullname: Adams et al.
– year: 20030400
  ident: 2003/0065164
  contributor:
    fullname: Puligadda et al.
– year: 20030100
  ident: 6503689
  contributor:
    fullname: Zampini et al.
– year: 20030700
  ident: 2003/0129542
  contributor:
    fullname: Shih et al.
– year: 20020500
  ident: 2002/0055061
  contributor:
    fullname: Taylor et al.
– year: 19990800
  ident: 5935760
  contributor:
    fullname: Shao et al.
– year: 20000400
  ident: 6048662
  contributor:
    fullname: Bruhnke et al.
– year: 20001200
  ident: 6156479
  contributor:
    fullname: Meador et al.
– year: 20031100
  ident: 6653049
  contributor:
    fullname: Pavelchek et al.
– year: 20020900
  ident: 6444320
  contributor:
    fullname: Takei et al.
– year: 20030800
  ident: 6602652
  contributor:
    fullname: Adams et al.
– year: 20000300
  ident: 6033830
  contributor:
    fullname: Sinta et al.
– year: 20020300
  ident: 2002/0028408
  contributor:
    fullname: Mao et al.
– year: 20020300
  ident: 2002/0031729
  contributor:
    fullname: Trefonas et al.
– year: 20020400
  ident: 2002/0045125
  contributor:
    fullname: Shao et al.
– year: 20020200
  ident: 2002/0022196
  contributor:
    fullname: Pavelchek et al.
– year: 20030700
  ident: 2003/0129531
  contributor:
    fullname: Oberlander et al.
– year: 20021000
  ident: WO 02/086624
– year: 19900200
  ident: 4904564
  contributor:
    fullname: Chiong
– year: 20011100
  ident: 6323310
  contributor:
    fullname: Puligadda et al.
– year: 20030900
  ident: 2003/0180559
  contributor:
    fullname: Wayton et al.
– year: 20011100
  ident: 6316165
  contributor:
    fullname: Pavelchek et al.
– year: 19960600
  ident: 5525457
  contributor:
    fullname: Nemoto et al.
– year: 20031200
  ident: 2003/0228474
  contributor:
    fullname: Taylor et al.
Score 2.8260722
Snippet New photoresist systems are provided that comprise an underlying processing (or barrier) layer composition and an overcoated photoresist layer. Systems of the...
SourceID uspatents
SourceType Open Access Repository
Title Photoresist systems
URI https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8012670
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfVxNT8MwDLXGhASc-BRjG-qBa6Bb0jScp1UV0lAPIO02uY0LB2inpdP-Pk6LJi7smkgvH5btvMh-AA-RomerIxRFjCQUW1kYU07ExCtBF6imMfre4cWrTt_VyzJa9iDd98J8sxuJNe_FPW7duqnb4koO753hRSf-7DUCK68-sKu-arSZLZ98pNUxk_cjE_rSrnmSnsEJQ_CTrWrcn6SRnMNx1o5eQI-qK7jMPmsmuOT4YoNOQNldQ5DM32ap2COsPja-MmUV_q4kb6DPDJ1uIZAhFRLD3OY0VVJZNGVJEmOKrNEacQCDf2HuDswN4bT7wvRCASPoN5stjTkHNvl9e8Afq5tnxg
link.rule.ids 230,309,786,808,891,64394
linkProvider USPTO
linkToPdf http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfZxLT8MwDICtaSAeJ55i49UD10C3pGl3hlXlNfUA0m6V27hwgHZaOvH3cVo0cYFrIjkPy3Yc2R_AVaBoYnSAogiRhGItiygqR2LkSNAFqnGIrnf4eaaTV_UwD-Y9SNa9MJ9sRmLBe7HXK7to6ra4kt17p3jRwZ8dI7By9IGv6qNGk5ryxnlaHXLyvuFirKPoT-NkF7ZZCD_aqsb-ChvxHmym7eg-9Kg6hIP0veYUlyxfrdchlO0RePH05TYRawnZ29LVpmT-z1ryGPqco9MJeNKnQqKfm5zGSiqDUVmSxJACE2mNOIDBn2KG_8xdwlZ6F2dP97PHU9jp_jMdNeAM-s1yReccEJv8oj3rN_C4asA
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Photoresist+systems&rft.inventor=Taylor%2C+Gary+N&rft.inventor=Xu%2C+Cheng-Bai&rft.number=8012670&rft.date=2011-09-06&rft.externalDBID=n%2Fa&rft.externalDocID=08012670