Photoresist systems

New photoresist systems are provided that comprise an underlying processing (or barrier) layer composition and an overcoated photoresist layer. Systems of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.

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Bibliographic Details
Main Authors Taylor, Gary N, Xu, Cheng-Bai
Format Patent
LanguageEnglish
Published 06.09.2011
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Summary:New photoresist systems are provided that comprise an underlying processing (or barrier) layer composition and an overcoated photoresist layer. Systems of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.