Asymmetric field effect transistor structure and method

• Main Authors: Anderson, Brent A, Bryant, Andres, Clark, Jr, William F, Nowak, Edward J
• Format: Patent
• Language: English
• Published: 29.03.2011

sgdDisclosed are embodiments of an asymmetric field effect transistor structure and a method of forming the structure in which both series resistance in the source region (R) and gate to drain capacitance (C) are reduced in order to provide optimal performance (i.e., to provide improved drive current with minimal circuit delay). Specifically, different heights of the source and drain regions and/or different distances between the source and drain regions and the gate are tailored to minimize series resistance in the source region (i.e., in order to ensure that series resistance is less than a predetermined resistance value) and in order to simultaneously to minimize gate to drain capacitance (i.e., in order to simultaneously ensure that gate to drain capacitance is less than a predetermined capacitance value).