Methods for forming a dual-doped emitter on a silicon substrate with a sub-critical shear thinning nanoparticle fluid

A Group IV based nanoparticle fluid is disclosed. The nanoparticle fluid includes a set of nanoparticles-comprising a set of Group IV atoms, wherein the set of nanoparticles is present in an amount of between about 1 wt % and about 20 wt % of the nanoparticle fluid. The nanoparticle fluid also inclu...

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Bibliographic Details
Main Authors Kim, Hyungrak, Abbott, Malcolm, Meisel, Andreas, Tai, Elizabeth, Jones, Augustus, Poplavskyy, Dmitry, Vanheusden, Karel
Format Patent
LanguageEnglish
Published 22.03.2011
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Summary:A Group IV based nanoparticle fluid is disclosed. The nanoparticle fluid includes a set of nanoparticles-comprising a set of Group IV atoms, wherein the set of nanoparticles is present in an amount of between about 1 wt % and about 20 wt % of the nanoparticle fluid. The nanoparticle fluid also includes a set of HMW molecules, wherein the set of HMW molecules is present in an amount of between about 0 wt % and about 5 wt % of the nanoparticle fluid. The nanoparticle fluid further includes a set of capping agent molecules, wherein at least some capping agent molecules of the set of capping agent molecules are attached to the set of nanoparticles.