Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method

A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic tran...

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Bibliographic Details
Main Authors Jansen, Bauke, Beeren, Raymond Gerardus Marius, De Jong, Anthonius Martinus Cornelis Petrus, Hoekerd, Kornelis Tijmen
Format Patent
LanguageEnglish
Published 11.01.2011
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Summary:A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.