Method for making an anti-reflection film of a solar cell

+−++−++2A method is disclosed for making an anti-reflection film of a solar cell. The method includes the step of providing a laminate. The laminate includes a ceramic substrate, a titanium-based compound film, a p type poly-silicon back surface field, a p type poly-silicon light-soaking film and an...

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Bibliographic Details
Main Authors Yang, Tsun-Neng, Lan, Shan-Ming, Chiang, Chin-Chen, Ma, Wei-Yang, Ku, Chien-Te, Huang, Yu-Hsiang
Format Patent
LanguageEnglish
Published 04.01.2011
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Summary:+−++−++2A method is disclosed for making an anti-reflection film of a solar cell. The method includes the step of providing a laminate. The laminate includes a ceramic substrate, a titanium-based compound film, a p type poly-silicon back surface field, a p type poly-silicon light-soaking film and an n type poly-silicon emitter. The laminate is passivated with SiCNO:Ar plasma in a plasma-enhanced vapor deposition device, thus filling the dangling bonds of the silicon atoms at the surface of the n type poly-silicon emitter, the dangling bonds of the silicon grains at the grain boundaries of the p type poly-silicon light-soaking film and the dangling bonds of the silicon atoms in the p type poly-silicon back surface field. Finally, the n type poly-silicon emitter is coated with an anti-reflection film of SiCN/SiO.