Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer

An antireflective hardmask composition includes an organic solvent, an initiator, and at least one polymer represented by Formulae A, B, or C as set forth in the specification.

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Bibliographic Details
Main Authors Yoon, Kyong Ho, Kim, Jong Seob, Uh, Dong Seon, Oh, Chang Il, Hyung, Kyung Hee, Kim, Min Soo, Lee, Jin Kuk
Format Patent
LanguageEnglish
Published 04.01.2011
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Summary:An antireflective hardmask composition includes an organic solvent, an initiator, and at least one polymer represented by Formulae A, B, or C as set forth in the specification.