Lithographic apparatus, device manufacturing method, and mask having a pellicle attached hereto

The mechanical properties of a pellicle frame and/or the pellicle are optimized so that the mechanical effect of the frame and pellicle on the mask shape in use is optimum for imaging. In particular the pellicle frame assembly may be arranged to be mechanically neutral, i.e., the mask adopts the sam...

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Bibliographic Details
Main Authors Bruls, Richard Joseph, Cicilia, Orlando Serapio, Uitterdijk, Tammo, Boom, Herman
Format Patent
LanguageEnglish
Published 30.11.2010
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Summary:The mechanical properties of a pellicle frame and/or the pellicle are optimized so that the mechanical effect of the frame and pellicle on the mask shape in use is optimum for imaging. In particular the pellicle frame assembly may be arranged to be mechanically neutral, i.e., the mask adopts the same shape with pellicle attached as it would without the pellicle.