Process of imaging a photoresist with multiple antireflective coatings

A process for imaging a photoresist comprising the steps of, a) forming a stack of multiple layers of organic antireflective coatings on a substrate; b) forming a coating of a photoresist over the upper layer of the stack of multiple layers of organic antireflective coatings; c) imagewise exposing t...

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Bibliographic Details
Main Authors Abdallah, David J, Neisser, Mark O, Dammel, Ralph R, Pawlowski, Georg, Biafore, John, Romano, Andrew R
Format Patent
LanguageEnglish
Published 19.10.2010
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Summary:A process for imaging a photoresist comprising the steps of, a) forming a stack of multiple layers of organic antireflective coatings on a substrate; b) forming a coating of a photoresist over the upper layer of the stack of multiple layers of organic antireflective coatings; c) imagewise exposing the photoresist with an exposure equipment; and, d) developing the coating with a developer.