Vortex chamber lids for atomic layer deposition

• Main Authors: Wu, Dien-Yeh, Bajaj, Puneet, Yuan, Xiaoxiong, Kim, Steven H, Chu, Schubert S, Ma, Paul F, Aubuchon, Joseph F
• Format: Patent
• Language: English
• Published: 24.08.2010

Embodiments of the invention relate to apparatuses and methods for depositing materials on substrates during atomic layer deposition processes. In one embodiment, a chamber for processing substrates is provided which includes a chamber lid assembly containing an expanding channel extending along a c...