High-resolution, nondestructive imaging of dielectric materials
The enhanced detection of defects in the bulk dielectric material (Specimen) having radiation partly reflected at interfaces where the dielectric constant changes (e.g., where there are defects or structures). A sinusoidal or quasisinusoidal wave (Microwave Source) results. Localization or imaging o...
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| Format | Patent |
| Language | English |
| Published |
17.08.2010
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| Online Access | Get full text |
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| Summary: | The enhanced detection of defects in the bulk dielectric material (Specimen) having radiation partly reflected at interfaces where the dielectric constant changes (e.g., where there are defects or structures). A sinusoidal or quasisinusoidal wave (Microwave Source) results. Localization or imaging of features is enhanced by exploiting the variation in distance resolution (Standoff+/−) in a sinusoidal or quasi-sinusoidal standing wave. At characteristic distances, the wave has a high slope and the amplitude of the wave varies strongly with small changes in distance (Standoff+/−). By inspecting at these characteristic distances (Standoff+/−), the resolution is enhanced. By systematically varying the position of the transducer or specimen, detailed images may be formed of the internal structure of the specimen across a range of depths. Defects and structures may be detected at smaller sizes than has previously been possible. |
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