Accurate capacitance measurement for ultra large scale integrated circuits

Test structures and methods for measuring contact and via parasitic capacitance in an integrated circuit are provided. The accuracy of contact and via capacitance measurements are improved by eliminating not-to-be-measured capacitance from the measurement results. The capacitance is measured on a ta...

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Bibliographic Details
Main Authors Doong, Yih-Yuh, Chang, Keh-Jeng, Mii, Yuh-Jier, Liu, Sally, Hung, Lien Jung, Chang, Victor Chih Yuan
Format Patent
LanguageEnglish
Published 10.08.2010
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Summary:Test structures and methods for measuring contact and via parasitic capacitance in an integrated circuit are provided. The accuracy of contact and via capacitance measurements are improved by eliminating not-to-be-measured capacitance from the measurement results. The capacitance is measured on a target test structure that has to-be-measured contact or via capacitance. Measurements are then repeated on a substantially similar reference test structure that is free of to-be-measured contact or via capacitances. By using the capacitance measurements of the two test structures, the to-be-measured contact and via capacitance can be calculated.