Methods for forming film patterns by disposing a liquid within a plural-level partition structure
A method for forming a film pattern by disposing a functional liquid in a pattern forming region partitioned by a bank includes: disposing a first bank forming material to a substrate so as to form a first bank layer; and forming a second bank layer on the first bank layer, wherein the first bank fo...
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| Main Authors | , |
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| Format | Patent |
| Language | English |
| Published |
03.08.2010
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| Online Access | Get full text |
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| Summary: | A method for forming a film pattern by disposing a functional liquid in a pattern forming region partitioned by a bank includes: disposing a first bank forming material to a substrate so as to form a first bank layer; and forming a second bank layer on the first bank layer, wherein the first bank forming material is an organic material while the second bank layer is made of a fluorine resin material covering the first bank layer. |
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