Resist material and electron beam recording resist material
th th The invention mainly intends to provide a resist material that is high in the sensitivity to light and an electron beam and enables to form a clear and fine pattern with less exposure. In order to achieve the object, the invention provides a resist material comprising a metal compound, wherein...
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| Main Author | |
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| Format | Patent |
| Language | English |
| Published |
11.05.2010
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| Online Access | Get full text |
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| Summary: | th th The invention mainly intends to provide a resist material that is high in the sensitivity to light and an electron beam and enables to form a clear and fine pattern with less exposure. In order to achieve the object, the invention provides a resist material comprising a metal compound, wherein a metal element constituting the metal compound is a 14group or 15group metal element and the metal compound is a stoichiometrically incomplete compound. |
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