Incorporating film optical property measurements into scatterometry metrology

A method includes collecting optical data from an unpatterned region including a first process layer. At least one optical parameter of the first process layer is determined based on the optical data associated with the unpatterned region. Optical data is collected from a patterned region including...

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Bibliographic Details
Main Authors Hartig, Carsten, Cain, Jason P
Format Patent
LanguageEnglish
Published 16.02.2010
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Summary:A method includes collecting optical data from an unpatterned region including a first process layer. At least one optical parameter of the first process layer is determined based on the optical data associated with the unpatterned region. Optical data is collected from a patterned region including a second process layer. At least one characteristic of the patterned region is determined based on the optical data associated with the patterned region and the at least one optical parameter.