Semiconductor laser device and method for manufacturing the same semiconductor laser device
A current blocking structure of a semiconductor laser includes a p-type InP buried layer, an n-type InP current blocking layer, and a p-type InP current blocking layer laminated along the mesa side surface of a ridge. In the structure, an upper end part of the n-type InP current blocking layer is co...
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Format | Patent |
Language | English |
Published |
02.02.2010
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Abstract | A current blocking structure of a semiconductor laser includes a p-type InP buried layer, an n-type InP current blocking layer, and a p-type InP current blocking layer laminated along the mesa side surface of a ridge. In the structure, an upper end part of the n-type InP current blocking layer is covered with the p-type InP buried layer and the p-type InP current blocking layer. The n-type InP current blocking layer is prevented from contacting n-type and p-type InP cladding layers. Creation of an ineffective current path from one of the n-type InP cladding layers through the n-type InP current blocking layer to a p-type InP cladding layer of the semiconductor laser is prevented. |
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AbstractList | A current blocking structure of a semiconductor laser includes a p-type InP buried layer, an n-type InP current blocking layer, and a p-type InP current blocking layer laminated along the mesa side surface of a ridge. In the structure, an upper end part of the n-type InP current blocking layer is covered with the p-type InP buried layer and the p-type InP current blocking layer. The n-type InP current blocking layer is prevented from contacting n-type and p-type InP cladding layers. Creation of an ineffective current path from one of the n-type InP cladding layers through the n-type InP current blocking layer to a p-type InP cladding layer of the semiconductor laser is prevented. |
Author | Watatani, Chikara |
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CorporateAuthor | Mitsubishi Denki Kabushiki Kaisha |
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References | Munakata et al. (6470038) 20021000 Ryder et al. (2003/0062517) 20030400 Suzuki (6084901) 20000700 Nagashima et al. (2002/0118717) 20020800 Haematsu (6504190) 20030100 Takaoka et al. (5822349) 19981000 Sakakibara et al. (4758535) 19880700 Yamamoto et al. (2003/0012240) 20030100 Miyashita et al. (6333946) 20011200 Narui et al. (5383215) 19950100 Yoshida et al. (2002/0041613) 20020400 Mori et al. (5390205) 19950200 Tsuchiya, Tomonobu, et al.; In situ Deep Etching for an InGaAlAs Buried Heterostructure by Using HCI Gas in a Metalorganic Vapor Phase Epitaxy Reactor, JP J. of Applied Physics, vol. 43, No. 10A, (2004), pp. L1247-L1249. Tanigami et al. (5596592) 19970100 |
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Snippet | A current blocking structure of a semiconductor laser includes a p-type InP buried layer, an n-type InP current blocking layer, and a p-type InP current... |
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Title | Semiconductor laser device and method for manufacturing the same semiconductor laser device |
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