Methods of forming a thin film and methods of manufacturing a capacitor and a gate structure using the same

A method of forming a thin film is provided. The method includes introducing an organometallic compound represented by the following formula onto a substrate;

Saved in:
Bibliographic Details
Main Authors Lee, Jung-Ho, Cho, Jun-Hyun, Choi, Jung-Sik, Chon, Sang-Mun
Format Patent
LanguageEnglish
Published 05.01.2010
Online AccessGet full text

Cover

More Information
Summary:A method of forming a thin film is provided. The method includes introducing an organometallic compound represented by the following formula onto a substrate;