Antireflective hardmask composition and methods for using same

Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include:

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Bibliographic Details
Main Authors Uh, Dong Sun, Jung, Ji Young, Oh, Jae Min, Oh, Chang Il, Kim, Do Hyeon
Format Patent
LanguageEnglish
Published 15.12.2009
Online AccessGet full text

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Abstract Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include:
AbstractList Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include:
Author Jung, Ji Young
Uh, Dong Sun
Oh, Jae Min
Oh, Chang Il
Kim, Do Hyeon
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Uh et al. (2006/0251990) 20061100
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Oh et al. (2007/0059635) 20070300
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Yunogami et al. (6607988) 20030800
Kamada et al. (2002/0182536) 20021200
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Kang et al. (2007/0154658) 20070700
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Oba et al. (5518864) 19960500
Thackeray et al. (5851730) 19981200
Sinta et al. (5886102) 19990300
Pavelcheck et al. (5939236) 19990800
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Snippet Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by...
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Title Antireflective hardmask composition and methods for using same
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