Antireflective hardmask composition and methods for using same

Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include:

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Bibliographic Details
Main Authors Uh, Dong Sun, Jung, Ji Young, Oh, Jae Min, Oh, Chang Il, Kim, Do Hyeon
Format Patent
LanguageEnglish
Published 15.12.2009
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Summary:Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include: