Semiconductor integrated circuit devices having upper pattern aligned with lower pattern molded by semiconductor substrate and methods of forming the same

Provided are semiconductor integrated circuit (IC) devices having an upper pattern aligned with a lower pattern molded by a semiconductor substrate and methods of forming the same. In the semiconductor IC devices, the lower pattern contacts the upper pattern using an active region and/or an isolatio...

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Bibliographic Details
Main Authors Kim, Bong-Soo, Hong, Hyeong-Sun, Shin, Soo-Ho, Ryu, Ho-In
Format Patent
LanguageEnglish
Published 29.09.2009
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Summary:Provided are semiconductor integrated circuit (IC) devices having an upper pattern aligned with a lower pattern molded by a semiconductor substrate and methods of forming the same. In the semiconductor IC devices, the lower pattern contacts the upper pattern using an active region and/or an isolation layer. The methods include preparing a semiconductor substrate having an active region. A lower pattern is formed on the active region. The lower pattern is surrounded by the active region and protrudes from a top surface of the active region. An upper pattern is disposed on the lower pattern. The upper pattern contacts the lower pattern.