Flash memory cells with reduced distances between cell elements
4 An anti-reflective coating (ARC) is formed over the various layers involved in a cell fabrication process. The ARC is selectively etched such that the edges of the etched areas of the ARC slope downward at an angle determined by the thickness of the ARC. The etching process could include CFchemist...
Saved in:
Main Authors | , , |
---|---|
Format | Patent |
Language | English |
Published |
25.08.2009
|
Online Access | Get full text |
Cover
Loading…
Summary: | 4 An anti-reflective coating (ARC) is formed over the various layers involved in a cell fabrication process. The ARC is selectively etched such that the edges of the etched areas of the ARC slope downward at an angle determined by the thickness of the ARC. The etching process could include CFchemistry. The inner edges of the sloped ARC areas reduce the original photo-defined space since the underlying layers are now defined by the sloped edges. |
---|