Composition for cleaning and degreasing, system for using the composition, and methods of forming and using the composition
A composition for cleaning and degreasing substrates, methods of forming and using the composition, and a system and method for recycling the composition are provided. The composition includes a 2-ethylhexyl ester and may also include co-solvents, diluents, surfactants, and adjutants.
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| Main Author | |
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| Format | Patent |
| Language | English |
| Published |
16.06.2009
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| Online Access | Get full text |
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| Summary: | A composition for cleaning and degreasing substrates, methods of forming and using the composition, and a system and method for recycling the composition are provided. The composition includes a 2-ethylhexyl ester and may also include co-solvents, diluents, surfactants, and adjutants. |
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