Lithographic apparatus and interferometer system
A lithographic apparatus is presented that includes a substrate holder configured to hold a substrate, an illuminator configured to condition a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a projection syste...
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| Format | Patent |
| Language | English |
| Published |
19.05.2009
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| Online Access | Get full text |
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| Summary: | A lithographic apparatus is presented that includes a substrate holder configured to hold a substrate, an illuminator configured to condition a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a projection system that projects the patterned beam onto a target portion of the substrate, and an interferometer system configured to measure a position of the object to assist in positioning the object. |
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