Method of manufacturing electron-emitting device, electron source, and image display device

In a method of manufacturing an electron-emitting device, an electroconductive film formed on a substrate is subjected to a clean processing to remove a foreign matter from the electroconductive film, and thereafter, energization is conducted on the electroconductive film, to form an electron-emitti...

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Bibliographic Details
Main Authors Uda, Yoshimi, Yanagisawa, Yoshihiro, Ishiwata, Kazuya
Format Patent
LanguageEnglish
Published 02.12.2008
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Summary:In a method of manufacturing an electron-emitting device, an electroconductive film formed on a substrate is subjected to a clean processing to remove a foreign matter from the electroconductive film, and thereafter, energization is conducted on the electroconductive film, to form an electron-emitting region. Accordingly, there is provided an electron-emitting device which avoids a formation defect of the electron-emitting region due to the existence of the foreign matter and which has satisfactory characteristics without fluctuation.