Methods and systems for analyzing a specimen using atomic force microscopy profiling in combination with an optical technique

A system that includes an optical subsystem and an atomic force microscope probe is provided. The optical subsystem is configured to generate positional information about a location on a surface of the specimen. The system is configured to position the probe proximate the location based on the posit...

Full description

Saved in:
Bibliographic Details
Main Authors Weber-Grabau, Michael, Bevis, Christopher F, Faeyrman, Michael, Zamir, Ofir
Format Patent
LanguageEnglish
Published 07.10.2008
Online AccessGet full text

Cover

More Information
Summary:A system that includes an optical subsystem and an atomic force microscope probe is provided. The optical subsystem is configured to generate positional information about a location on a surface of the specimen. The system is configured to position the probe proximate the location based on the positional information. One method includes generating positional information about a location on a surface of a specimen with an optical subsystem. The method also includes positioning an atomic force microscopy probe proximate the location based on the positional information. Another system includes an optical subsystem configured to measure overlay of a wafer using scatterometry. The system also includes an atomic force microscope configured to measure a characteristic of a feature on the wafer. An additional method includes measuring overlay of a wafer using scatterometry. The method also includes measuring a characteristic of a feature on the wafer using atomic force microscopy.