Lithographic apparatus and device manufacturing method

A lithographic apparatus includes a substrate table constructed to hold a first substrate of a first type, the first substrate having a polished surface; and a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The polished surface supports a sec...

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Bibliographic Details
Main Authors Van De Moosdijk, Michael Josephus Evert, Simon, Klaus, De Laat, Wilhelmus Johannes Maria
Format Patent
LanguageEnglish
Published 05.08.2008
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Summary:A lithographic apparatus includes a substrate table constructed to hold a first substrate of a first type, the first substrate having a polished surface; and a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The polished surface supports a second substrate of a second type and the projection system is configured to project the patterned radiation beam onto the second substrate.