Temperature conditioned load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate with such a load lock

A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when in the load lock. The load lock al...

Full description

Saved in:
Bibliographic Details
Main Authors Klomp, Albert Jan Hendrik, Hoogkamp, Jan Frederik, Visser, Raimond, Vugts, Josephus Cornelius Johannes Antonius, Vullings, Henricus Johannes Louis Marie, Kuipers, Leo Wilhelmus Maria, Franssen, Johannes Hendrikus Gertrudis
Format Patent
LanguageEnglish
Published 01.07.2008
Online AccessGet full text

Cover

More Information
Summary:A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when in the load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.