Inspection device and inspection method for pattern profile, exposure system
Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the pattern is for detecting the profile error of the pattern having a cross s...
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| Main Authors | , , , , , |
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| Format | Patent |
| Language | English |
| Published |
18.12.2007
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| Online Access | Get full text |
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| Summary: | Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the pattern is for detecting the profile error of the pattern having a cross section with a projection and a recess. This inspection apparatus includes a plate on which a pattern is mounted, light sources and which can change angles of illuminating light emitted onto the pattern, within a range of 15 to 75 degrees with reference to the top surface of the pattern, and photodetectors and which can receive reflected light from the pattern at an angle within a range of 15 to 75 degrees with reference to the top surface of the pattern. The inspection apparatus is characterized by that the profile error of the pattern is detected based on an amount of the reflected light from an edge between the top surface and the side surface of each of the patterns. |
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