Apparatus and method for measuring the thickness of a thin film via the intensity of reflected light

A thin film thickness measurement apparatus that can measure immediately after film growth thickness of a thin film of a substrate that is grown includes a light receiving/projecting unit directing light substantially perpendicular to the substrate and receiving light reflected from the substrate, a...

Full description

Saved in:
Bibliographic Details
Main Authors Hatanaka, Masatsugu, Tanaka, Junichi, Tanigawa, Toru, Tagusa, Yasunobu
Format Patent
LanguageEnglish
Published 04.12.2007
Online AccessGet full text

Cover

More Information
Summary:A thin film thickness measurement apparatus that can measure immediately after film growth thickness of a thin film of a substrate that is grown includes a light receiving/projecting unit directing light substantially perpendicular to the substrate and receiving light reflected from the substrate, and an analyze unit analyzing thickness of a thin film of the substrate according to intensity of reflected light received by the light receiving/projecting unit.