Organosilicate resins as hardmasks for organic polymer dielectrics in fabrication of microelectronic devices

This invention is directed to a method of making a composition in which a silane having an unsaturated group and a silane having an aromatic group are hydrolyzed. In this method the more highly reactive silane is continuously added during the hydrolysis reaction of the less reactive silane. The comp...

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Bibliographic Details
Main Authors Townsend, III, Paul H, Mills, Lynne K, Gombar-Fetner, Sheila
Format Patent
LanguageEnglish
Published 11.09.2007
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Summary:This invention is directed to a method of making a composition in which a silane having an unsaturated group and a silane having an aromatic group are hydrolyzed. In this method the more highly reactive silane is continuously added during the hydrolysis reaction of the less reactive silane. The composition can be used in the fabrication of microelectronic devices, particularly as hardmasks or etchstops.