Method for adjusting a substrate in an appliance for carrying out exposure
The unevennesses of a chuck are measured at various positions and are stored, as discrepancies from an idealized plane, in a databank. The measured discrepancies are used to calculate corrections for the predetermined settings for the focus distance and/or the tilt of the chuck. These corrections ar...
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| Main Authors | , |
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| Format | Patent |
| Language | English |
| Published |
24.07.2007
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| Online Access | Get full text |
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| Summary: | The unevennesses of a chuck are measured at various positions and are stored, as discrepancies from an idealized plane, in a databank. The measured discrepancies are used to calculate corrections for the predetermined settings for the focus distance and/or the tilt of the chuck. These corrections are in each case used differently for adjusting the respective exposure of the exposure areas. |
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