Non-contact mobile charge measurement with leakage band-bending and dipole correction
Corona charges are used to bias a wafer to push down mobile charges and then pull them up during temperature cycles. Mobile charge is measured from the drops in the corona voltage due to the mobile charges. Corrections are made in the measurements for dipole potentials, leakage and silicon band-bend...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
12.06.2007
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Online Access | Get full text |
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Summary: | Corona charges are used to bias a wafer to push down mobile charges and then pull them up during temperature cycles. Mobile charge is measured from the drops in the corona voltage due to the mobile charges. Corrections are made in the measurements for dipole potentials, leakage and silicon band-bending. |
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