Method and apparatus for performing limited area spectral analysis

A method and apparatus for obtaining in-situ data of a substrate in a semiconductor substrate processing chamber is provided. The apparatus includes an optics assembly for acquiring data regarding a substrate and an actuator assembly adapted to laterally move the optics assembly in two dimensions re...

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Bibliographic Details
Main Authors Davis, Matthew F, Lian, Lei, Uo, Yasuhiro, Willwerth, Michael D, Netchitaliouk, Andrei Ivanovich
Format Patent
LanguageEnglish
Published 02.01.2007
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Summary:A method and apparatus for obtaining in-situ data of a substrate in a semiconductor substrate processing chamber is provided. The apparatus includes an optics assembly for acquiring data regarding a substrate and an actuator assembly adapted to laterally move the optics assembly in two dimensions relative to the substrate.