Resist polymer, resist composition and patterning process

123 6 34 5 7 110 A polymer comprising recurring units of formulae (1), (2), (3) and (4) increases a dissolution rate in an alkali developer under the action of an acid. R, R, Rand Rare H or CH, Rand Rare H or OH, X is a tertiary exo-alkyl group having a bicyclo[2.2.1]heptane framework, represented b...

Full description

Saved in:
Bibliographic Details
Main Authors Watanabe, Takeru, Nishi, Tsunehiro, Tsuchiya, Junji, Funatsu, Kenji, Hasegawa, Koji
Format Patent
LanguageEnglish
Published 14.11.2006
Online AccessGet full text

Cover

Abstract 123 6 34 5 7 110 A polymer comprising recurring units of formulae (1), (2), (3) and (4) increases a dissolution rate in an alkali developer under the action of an acid. R, R, Rand Rare H or CH, Rand Rare H or OH, X is a tertiary exo-alkyl group having a bicyclo[2.2.1]heptane framework, represented by any of formulae (X-1) to (X-4): wherein Ris C-Calkyl, and Y is a tertiary alkyl group having an adamantane structure. A resist composition comprising the inventive polymer has a sensitivity to high-energy radiation, improved resolution and minimized proximity bias and lends itself to micropatterning with electron beams or deep UV for VLSI fabrication.
AbstractList 123 6 34 5 7 110 A polymer comprising recurring units of formulae (1), (2), (3) and (4) increases a dissolution rate in an alkali developer under the action of an acid. R, R, Rand Rare H or CH, Rand Rare H or OH, X is a tertiary exo-alkyl group having a bicyclo[2.2.1]heptane framework, represented by any of formulae (X-1) to (X-4): wherein Ris C-Calkyl, and Y is a tertiary alkyl group having an adamantane structure. A resist composition comprising the inventive polymer has a sensitivity to high-energy radiation, improved resolution and minimized proximity bias and lends itself to micropatterning with electron beams or deep UV for VLSI fabrication.
Author Nishi, Tsunehiro
Watanabe, Takeru
Tsuchiya, Junji
Hasegawa, Koji
Funatsu, Kenji
Author_xml – sequence: 1
  givenname: Takeru
  surname: Watanabe
  fullname: Watanabe, Takeru
– sequence: 2
  givenname: Tsunehiro
  surname: Nishi
  fullname: Nishi, Tsunehiro
– sequence: 3
  givenname: Junji
  surname: Tsuchiya
  fullname: Tsuchiya, Junji
– sequence: 4
  givenname: Kenji
  surname: Funatsu
  fullname: Funatsu, Kenji
– sequence: 5
  givenname: Koji
  surname: Hasegawa
  fullname: Hasegawa, Koji
BookMark eNrjYmDJy89L5WSwDEotziwuUSjIz6nMTS3SUSiC8JPzcwvyizNLMvPzFBLzUhQKEktKUovyMvPSFQqK8pNTi4t5GFjTEnOKU3mhNDeDgptriLOHbmkxUHFqXklxfHpRIogyMDc0NjUyNzAmQgkAV24x6A
ContentType Patent
CorporateAuthor Shin-Etsu Chemical Co., Ltd
CorporateAuthor_xml – name: Shin-Etsu Chemical Co., Ltd
DBID EFH
DatabaseName USPTO Issued Patents
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EFH
  name: USPTO Issued Patents
  url: http://www.uspto.gov/patft/index.html
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
ExternalDocumentID 07135270
GroupedDBID EFH
ID FETCH-uspatents_grants_071352703
IEDL.DBID EFH
IngestDate Sun Mar 05 22:37:50 EST 2023
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-uspatents_grants_071352703
OpenAccessLink https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7135270
ParticipantIDs uspatents_grants_07135270
PatentNumber 7135270
PublicationCentury 2000
PublicationDate 20061114
PublicationDateYYYYMMDD 2006-11-14
PublicationDate_xml – month: 11
  year: 2006
  text: 20061114
  day: 14
PublicationDecade 2000
PublicationYear 2006
References Nishi et al. (2003/0054289) 20030300
Kinsho et al. (6312867) 20011100
Kobayashi et al. (2003/0013039) 20030100
(9-73173) 19970300
(2003-84438) 20030300
Nozaki et al. (5968713) 19991000
Nishi et al. (6703183) 20040300
(2000-336121) 20001200
(4-39665) 19920200
Nishi et al. (2003/0054290) 20030300
References_xml – year: 20030300
  ident: 2003/0054290
  contributor:
    fullname: Nishi et al.
– year: 20030300
  ident: 2003/0054289
  contributor:
    fullname: Nishi et al.
– year: 20030300
  ident: 2003-84438
– year: 19991000
  ident: 5968713
  contributor:
    fullname: Nozaki et al.
– year: 19920200
  ident: 4-39665
– year: 20001200
  ident: 2000-336121
– year: 20011100
  ident: 6312867
  contributor:
    fullname: Kinsho et al.
– year: 20040300
  ident: 6703183
  contributor:
    fullname: Nishi et al.
– year: 19970300
  ident: 9-73173
– year: 20030100
  ident: 2003/0013039
  contributor:
    fullname: Kobayashi et al.
Score 2.6498716
Snippet 123 6 34 5 7 110 A polymer comprising recurring units of formulae (1), (2), (3) and (4) increases a dissolution rate in an alkali developer under the action of...
SourceID uspatents
SourceType Open Access Repository
Title Resist polymer, resist composition and patterning process
URI https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7135270
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1RS8MwED7mEHRPDhWnTvLgo9F2dkvyPFaKoIyhsLeRtqcvWxvaDvHfe5eO4Yt7TAKX40Jyuct3XwDutX99wVTqLMxllOYojTZWouJ68ImygeWE_uvbJPmIXpbjZQeSfS3MhraRdKRL_bitXVN6cCUd7-3Cy5b8mTkCC2Yf-C7Wpc3n-ecTfzU3UhS8H-mAoV2zOOnBCYmgK1vR1H-cRnwGx3Pf24cOFudgFliTTYUr1z8brB5E1bYZ1L1DTgkK64XzjJecrhCuRfFfgIhn79NE7udZfVWMX1kFO32eL6FLcTxegciMQlTGqiBEZpnSIeqM6egscjXsaACDf8VcHxi7gVOfF2BsWnQL3aba4pA8ZZPeeTP8AixGdEs
link.rule.ids 230,309,786,808,891,64396
linkProvider USPTO
linkToPdf http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LT8MwDLamgXicQIAYzxw4EmhHWZozrCqvqUIg7ValreGytVHbCfHvsdNp4gLHJJJj5eXY-fwF4CJ0ry-YyTD3CxlkBUodaiNRcT74SBnPcED_ZTKK34PH6e20B_EqF2ZO20ha0qW5WjS2rRy4ko73buJlR_7MHIElsw98lbPKFEnxcc1fzQ0VOe9rbGN5rY-jeBs2SQhd2sq2-WU2oh1YT1ztLvSw3AP9ig2NqrDV7HuO9aWouzLDupfYKUGOvbCO85IDFsJ2OP59ENH47S6Wq37Sz5oRLKm31OjmAPrkyeMhiFwrRKWN8nxknqnQxzBnQjqDnA87HMDgTzFH_7Sdw0ZyH6XPD5OnY9hyQQIGqgUn0G_rBZ6S2WyzMzciPwx3d0c
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Resist+polymer%2C+resist+composition+and+patterning+process&rft.inventor=Watanabe%2C+Takeru&rft.inventor=Nishi%2C+Tsunehiro&rft.inventor=Tsuchiya%2C+Junji&rft.inventor=Funatsu%2C+Kenji&rft.inventor=Hasegawa%2C+Koji&rft.number=7135270&rft.date=2006-11-14&rft.externalDBID=n%2Fa&rft.externalDocID=07135270