Lithographic apparatus and device manufacturing method

In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, sub...

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Main Authors Derksen, Antonius Theodorus Anna Maria, Donders, Sjoerd Nicolaas Lambertus, Hoogendam, Christiaan Alexander, Lof, Joeri, Loopstra, Erik Roelof, Mertens, Jeroen Johannes Sophia Maria, Mulkens, Johannes Catharinus Hubertus, Sengers, Timotheus Franciscus, Straaijer, Alexander, Streefkerk, Bob
Format Patent
LanguageEnglish
Published 11.07.2006
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Summary:In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.